Minilock Orion PECVD
Trion Technology
The Minilock-Orion is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Minilock-Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.
*Manufacturer's specifications subject to change without notice.
Manufacturer of a wide variety of custom Plasma Etch, Strip and Deposition Equipment for the Photonics, Compound Semiconductor, MEMS, Opto-Electronic and other markets since 1989. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability.
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