Phantom RIE
Trion Technology
The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform. For more information, email: info@triontech.com
*Manufacturer's specifications subject to change without notice.
Manufacturer of a wide variety of custom Plasma Etch, Strip and Deposition Equipment for the Photonics, Compound Semiconductor, MEMS, Opto-Electronic and other markets since 1989. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability.
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