Minilock Phantom RIE
Trion Technology
The Minilock Phantom RIE is a Reactive Ion Etch system with a vacuum loadlock. The Loadlock allows the main chamber to continue pumping whilst a sample is loaded, or unloaded, and is ideal for toxic gas chemistries. The system is highly configurable with such options as a ICP, and endpoint. For more information, email: info@triontech.com
*Manufacturer's specifications subject to change without notice.
Manufacturer of a wide variety of custom Plasma Etch, Strip and Deposition Equipment for the Photonics, Compound Semiconductor, MEMS, Opto-Electronic and other markets since 1989. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability.
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